Country | Type | Number | Dated | Case |
United States Of America | Issued Patent | 10,989,668 | 04/27/2021 | 2016-191 |
The ∼10% optical contrast of graphene on
specialized substrates like oxide-capped silicon substrates, together with the
high-throughput and noninvasive features of optical microscopy, have greatly
facilitated the use and research of graphene research for the past decade. However, substantially lower contrast is obtained
on transparent substrates. Visualization of nanoscale defects in graphene,
e.g., voids, cracks, wrinkles, and multilayers, formed during either growth or
subsequent transfer and fabrication steps, represents yet another level of
challenge for most device substrates.
UC Berkeley
researchers have developed a facile, label-free optical microscopy method to
directly visualize graphene on transparent inorganic and polymer substrates at
30−40% image contrast per graphene layer. Their noninvasive approach overcomes typical challenges
associated with transparent substrates, including insulating and rough
surfaces, enables unambiguous identification of local graphene layer numbers
and reveals nanoscale structures and defects with outstanding contrast and
throughput. We thus demonstrate in situ monitoring of nanoscale defects in
graphene, including the generation of nano-cracks under uniaxial strain, at up
to 4× video rate.
Direct Optical Visualization of Graphene and Its Nanoscale Defects on Transparent Substrates
graphene, nanoscale defects, transparent substrate, microscopy, silicon substrate