University researchers have developed an easy one-step approach to pattern uniform catalyst lines for the growth of dense, aligned parallel arrays of single-walled carbon nanotubes (SWNTs) on quartz wafers by using photolithography or polydimethylsiloxane (PDMS) stamp micro-contact printing (μCP).
University researchers have developed an easy one-step approach to pattern uniform catalyst lines for the growth of dense, aligned parallel arrays of single-walled carbon nanotubes (SWNTs) on quartz wafers by using photolithography or polydimethylsiloxane (PDMS) stamp micro-contact printing (μCP). By directly doping a FeCl3/methanol solution into Shipley 1827 photoresist or polyvinylpyrrolidone (PVP), various catalyst lines can be well-patterned on a wafer scale. In addition, during the chemical vapor deposition (CVD) growth of SWNTs the polymer layers play a very important role in the formation of mono-dispersed nanoparticles. This universal and efficient method for the patterning growth of SWNTs arrays on a surface is compatible with the microelectronics industry, thus enabling of the fabrication highly integrated circuits of SWNTs.</p>
Increasing the SWNT density enhances the electrical properties of the SWNTs by allowing for:
This process can be widely used in the synthesis of SWNTs on various substrates including quartz wafers, silicon wafers and sapphire wafers. The resulting SWNTs can be used in high-frequency electronics and highly-integrated circuits
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Country | Type | Number | Dated | Case |
United States Of America | Issued Patent | 8,945,502 | 02/03/2015 | 2008-647 |
nanotubes, SWNT