UCLA researchers in the Department of Chemistry and Biochemistry have developed a photolithographic method for the high-throughput, parallel production of microscale and nanoscale objects with tailored shapes and dimensions using a single photomask.
The high-throughput fabrication of nanoscale and microscale particles with a wide variety of shapes and functionalities is of significant interest in the study of synthetic colloidal chemistry. Photolithography is a promising technique for this purpose, but the fabrication of different shape-designed particles with fine 3D nanoscale features typically requires that a different photomask be used for each different particle shape.
The technology utilizes the nanopositioning capabilities of an optical stepper lithography stage to fabricate nanoscale and microscale particles with different shapes and functionalities using a single photomask. This potentially eliminates the cost to make a different photomask every time a different shape-designed nanoscale or microscale particle is needed. Out-of-plane features can be generated with this technology.
The feasibility of the proposed invention to generate microscale particles of different shapes and dimensions with high fidelity has been demonstrated.
|United States Of America||Issued Patent||10,317,799||06/11/2019||2015-375|