System for Patterned Illumination Microscopy

Tech ID: 24720 / UC Case 2015-087-0

Patent Status

Country Type Number Dated Case
United States Of America Published Application 20180048811 02/15/2018 2015-087
Patent Cooperation Treaty Published Application WO2016123508 08/04/2016 2015-087
 

Brief Description

Existing structured illumination microscopy can increase the resolution of an image by a factor of 2, however, it requires expensive optical or mechanical devices (e.g., spatial light modulators, digital micromirror devices, or piezo translation stages).  Also, the existing movable patterned mask generated by the light interference using SLM or DMD suffers from hysteresis and repeatability problems due to mechanical motion.

 

UC Berkeley researchers have developed a computational illumination hardware and software system that can achieve pattern-shift on the object plane without mechanically switching the patterns and therefore without movement of any component.  The lensless system can be easily implemented into existing microscopes without extra hardware can can be extremely fast and suitable for real-time imaging applications.   

  

Suggested uses

  • Super high resolution microscopy
  • Cellular imaging
  • Patterned illumination imaging systems
  • Fourier Ptychography microscopy

Advantages

  • Inexpensive (~$100) hardware compared to existing structured illumination hardware and methods (>$1000)
  • Easily implemented into existing microscopes without extra hardware (no additional lenses and no modification of the optical setup)
  • Does not suffer hysteresis and repeatability problems of mechanical motion and is not polarization sensitive
  • Can be used in Fourier Ptychography microscopy

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Inventors

  • Waller, Laura

Other Information

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