High Pressure, Laser Floating Zone Crystal Growth Furnace

Tech ID: 30148 / UC Case 2018-616-0

Brief Description

A furnace that allows for the growth of crystalline material under applied gas pressures of up to 1000atm.

Background

The highest pressure available for current optical floating zone Furnace is 300 atm, which limits the growth of crystals and components. Current starting materials used for material research for the relatively large diameters (6-8mm) are also prohibitively expensive. New technology that increases pressure range and lowers the cost of research would achieve higher efficiency and accuracy, and produce wider range of materials.

Description

Researchers at the University of California, Santa Barbara have developed a furnace which allows for the growth of crystalline material under applied gas pressures of up to 1000atm. Using the floating zone technique, this technology increases the pressure range, which allows wider range of materials to be produced compared to any commercially available furnace.

Advantages

  • Increased pressure range (up to 1000atm)
  • Controls heating power from room temperature to greater than 3000  ̊C
  • Allows for small focal spot size and sharp crystal growth gradients
  • Promotes growth of high purity volatile and metastable compounds
  • Higher efficiency and accuracy at a lower cost

Applications

  • Materials research technologies
  •  Research equipment

Patent Status

Patent Pending

Contact

Learn About UC TechAlerts - Save Searches and receive new technology matches

Inventors

  • Aling, Michael
  • Schmehr, Julian
  • Wilson, Stephen D.

Other Information

Keywords

optical floating zone furnace, high pressure, materials, compounds, pressure range, focal spot size

Categorized As