An All Solid-State Wafer Bonding Method Of III-V Materials On Si CMOS Using Patterned Metal Structures

Tech ID: 24761 / UC Case 2015-074-0

Background

III-V compound semiconductor materials comprise elements from the third group (such as Al, Ga, and In) and fifth group (such as N, P, As, and Sb) of the periodic table. It has become a trend for both scientific research and semiconductor industry to combine the high-speed III-V semiconductors as both electronic and optoelectronic devices with low-cost Si circuitry. Integration of III-V functional devices on Si substrates was generally achieved by epitaxial growth of III-V material layers on Si, or by directly bonding of III-V semiconductor layers with the Si wafer.

Most methods are not compatible with CMOS process due to their complicated procedures, or strong changes to the surface morphology of bonding layer, set aside the ability to arbitrarily define structures at any location and with any shape in a planar CMOS-like fabrication process.

Presently need an improved way to:

(1) integrate III-V semiconductors onto Si that is compatible with current CMOS fabrication procedure,

(2) cause minimum or zero crystal defects to the bonded semiconductor layers, and

(3) enable further fabrication of advanced functional devices using the bonded layers atop functional CMOS circuitry without degraded performance.

Technology Description

Electrical engineers from UC San Diego have developed a novel wafer bonding method for integrating bulk or thin film functional semiconductor materials (III-V compounds) to a rigid host substrate (e.g.  Si wafer). Specifically, this invention exploits a solid-state reaction between the functional semiconductor layer and a metal layer that is pre-deposited and optionally pre-patterned on the rigid host substrate, a low temperature heat treatment (< 250 C), and a fast bonding process. This novel wafer bonding process reduces the critical requirements of extremely low surface roughness (< 0.5 nm) for both the functional semiconductors and the host substrate, enables multiple layers of functional semiconductors for bonding to the host substrate with precise locations, and provides the platform to fabricate advanced electronic and optoelectronic devices utilizing the transferred functional semiconductors on Si, all in a CMOS compatible fabrication process.

This technology also teaches the novel conceptual design of “Self-aligned Electrical Contacts (SAEC)”, in which the pre-patterned electrical metal contacts on the host substrate play the roles of bonding with functional semiconductors and also as conductive electrical leads to the outer electrodes.

To summarize, this patent-pending technology demonstrates the first prototype for integrating III-V (or other functional semiconductor) materials onto rigid host substrate (for example Si) by a solid-state reaction between the III-V semiconductor and the metal layer pre-defined on the host substrate.

Invention provides a number of advantages over existing methods, including:

(1) Tolerance to surface imperfections.

(2) Compatibility to Si CMOS process.

(3) Integration to a variety of substrates.

(4) Possibility of multi-layer stacking.

(5)“Self-aligned electrical contacts (SAEC)” for III-V transistors on Si. This method may lead the way to very short-channel high-performance devices.

Applications

This invention enables the integration of high-mobility III-V transistor layers, such as InGaAs, atop Si CMOS circuits. It also enables the integration of the high-speed optoelectronic elements made from InP (waveguides, modulators, switches and photodetectors) that are necessary for optical transmission with large data rate and bandwidth atop a Si CMOS circuit. This has a huge potential market for big data centers and on-chip optical processing in microprocessor chips. Further, light emission (Lasers, light emitting diodes) and detection (photodetectors, photoconductors, photovoltaic cells) made of III-V materials can be integrated with this invention on Si CMOS.

State Of Development

Inventors have demonstrated the feasibility of manufacturing methods for bonding III-V semiconductor materials to a rigid host substrate by utilizing metal-semiconductor solid-state reactions. Both bulk (InP) and thin film (InGaAs) III-V semiconductors have been successfully bonded to Si wafer with SiO2 dielectric layer with metal stripes atop in the lab as completion with the current invention. The experimental results demonstrate the feasibility of the novel wafer bonding technology and the novel SAEC process for advanced functional device fabrication in a CMOS compatible process for potential active III-V devices on top of CMOS circuitry.  

Patent Status

Country Type Number Dated Case
United States Of America Issued Patent 10,679,964 06/09/2020 2015-074
 

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Keywords

semiconductor, wafer bonding, material

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